Hydrogen Ambient Temperature Purification
Impurities removed can include: H2O, O2, CO, CO2, NMHC, Acids, Bases, Organics, and Refractory Compounds. Impurities are reduced to less than 1 part-per-billion, in most cases.
(For CH4 or N2 removal, see our MonoTorr product line.)
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- Request a quote / Contact Us
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- Help Me Select A Purifier
- Purifier Lifetime
- SDS
- Bypass / Piping Manifolds
To select a purifier please choose: |
Part Number Example |
| 1. Model Size | MC1 |
| 2. Purification Media | -202 |
| 3. Options (F = 0.003µm Particle Filter or V = Inlet/Outlet Isolation Valves) | FV |
| Part number breakdown |
| Model Size | Average Flow (slpm) For lifetime guidance |
Max Flow (slpm) | Max Pressure (psig) | Drawing |
| MC1 | 0.5 | 5 | 1,000 | Drawing |
| MC45 | 1.5 | 10 | 1,000 | Drawing |
| MC50 | 1.5 | 10 | 1,000 | Drawing |
| MC190 | 5 | 50 | 250 | Drawing |
| MC200 | 5 | 50 | 250 | Drawing |
| MC400 | 9 | 60 | 250 | Drawing |
| MC450 | 10 | 75 | 250 | Drawing |
| MC500 | 12 | 100 | 250 | Drawing |
| MC700 | 25 | 120 | 250 | Drawing |
| MC1500 | 40 | 250 | 250 | Drawing |
| MC2525 | 80 | 300 | 250 | Drawing |
| MC2550 | 80 | 500 | 250 | Drawing |
| MC3000 | 80 | 500 | 250 | Drawing |
| MC4500 | 200 | 1,000 | 250 | Drawing |
| MC9000 | 300 | 1,000 | 250 | Drawing |
| MC14K | 400 | 2,000 | 250 | Drawing |
| High Pressure Models | ||||
| HP190 | 5 | 50 | 1,000 | Drawing |
| HP400 | 9 | 60 | 1,000 | Drawing |
| HP700 | 25 | 120 | 1,000 | Drawing |
| HP3000 | 80 | 500 | 1,000 | Drawing |
| SP70 | 1.5 | 20 | 3,000 | Drawing |
| SP300 | 10 | 100 | 3,000 | Drawing |
| SP600 | 15 | 200 | 3,000 | Drawing |
| Special 'U' shaped Manifold | ||||
| PG1 | 10 | 15 | 250 | Drawing |
| Media | Comment | Gases Purified | Impurities removed | Regenerable | Specification |
| 904 | For Most Applications | H2, D2 | H2O, CO, CO2, O2 < 100 ppt Volatile Acids, Organics, Refractory compounds < 1 ppt Volatile Bases < 5 ppt Metals < 1 ppb |
Yes | Specification |
| 202 | Dryer | H2, D2 | H2O < 1ppb | Yes | Specification |
| 203 | Dryer for Optics/Litho | H2, D2 | H2O, CO2 < 100 ppt Volatile Acids, Organics, Refractory compounds < 1 ppt Volatile Bases < 5 ppt Metals < 1 ppb |
Yes | Specification |
| 403 | AMC Removal for Optics/Litho | H2, D2 | Volatile Acids, Organics, Refractory compounds < 1 ppt Volatile Bases < 5 ppt Metals < 1 ppb |
No | Specification |
| 404 | For HC removal only | H2, D2 | Organics < 1 ppt Metals < 1 ppb |
Yes | Specification |
| Option | Description | Comments |
| F | 0.003 µm Particle Filter option | If not ordered, 2 µm filter standard |
| HF | 0.003 µm high-flow Particle Filter option | For use with MC4500 model only |
| V | Inlet and outlet valves | 1/4" or 1/2" Manual diaphragm Valves |
