Nitrogen and Rare Gas (He, Ar, Kr, Ne, Xe) Purifiers
Impurities removed can include H2O, CO, CO2, O2, H2, NMHC, Acids, Bases, Organics, and Refractory Compounds. Impurities in these gases are reduced to less than 1 part-per-billion, in most cases.
(For CH4 or N2 removal, see our MonoTorr product line.)
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To select a purifier please choose: |
Part Number Example |
| 1. Model Size | MC1 |
| 2. Purification Media | -202 |
| 3. Options (F = 0.003µm Particle Filter or V = Inlet/Outlet Isolation Valves) | FV |
| Part number breakdown |
| Model Size | Average Flow (slpm) For lifetime guidance |
Max Flow (slpm) | Max Pressure (psig) | Drawing |
| MC1 | 0.5 | 5 | 1,000 | Drawing |
| MC45 | 1.5 | 10 | 1,000 | Drawing |
| MC50 | 1.5 | 10 | 1,000 | Drawing |
| MC190 | 5 | 50 | 250 | Drawing |
| MC200 | 5 | 50 | 250 | Drawing |
| MC400 | 9 | 60 | 250 | Drawing |
| MC450 | 10 | 75 | 250 | Drawing |
| MC500 | 12 | 100 | 250 | Drawing |
| MC700 | 25 | 120 | 250 | Drawing |
| MC1500 | 40 | 250 | 250 | Drawing |
| MC2525 | 80 | 300 | 250 | Drawing |
| MC2550 | 80 | 500 | 250 | Drawing |
| MC3000 | 80 | 500 | 250 | Drawing |
| MC4500 | 200 | 1,000 | 250 | Drawing |
| MC9000 | 300 | 1,000 | 250 | Drawing |
| MC14K | 400 | 2,000 | 250 | Drawing |
| High Pressure Models | ||||
| HP190 | 5 | 50 | 1,000 | Drawing |
| HP400 | 9 | 60 | 1,000 | Drawing |
| HP700 | 25 | 120 | 1,000 | Drawing |
| HP3000 | 80 | 500 | 1,000 | Drawing |
| SP70 | 1.5 | 20 | 3,000 | Drawing |
| SP300 | 10 | 100 | 3,000 | Drawing |
| SP600 | 15 | 200 | 3,000 | Drawing |
| Special 'U' shaped Manifold | ||||
| PG1 | 10 | 15 | 250 | Drawing |
| Media | Comment | Gases Purified | Impurities Removed | Regenerable | Specification |
| 902 | For Most Applications | Ar, He, Kr, N2, Ne, Xe | H2O, O2, CO, CO2, H2 to < 100 ppt Volatile Acids, Organics, Refractory Compounds to < 1 ppt Volatile Bases < 5 ppt Metals < 1 ppbV |
Yes | Specification |
| 202 | Dryer Only | Ar, He, Kr, N2, Ne, Xe | H2O < 1 ppb | Yes | Specification |
| 203 | Dryer for Optics/Litho | Ar, He, Kr, N2, Ne, Xe | H2O, CO2 < 100 ppt Volatile Acids, Organics, Refractory compounds < 1 ppt Volatile Bases < 5 ppt Metals < 1 ppb |
Yes | Specification |
| 403 | AMC removal for Optics/Litho | Ar, He, Kr, N2, Ne, Xe | Volatile Acids, Organics, Refractory compounds < 1 ppt Volatile Bases < 5 ppt Metals < 1 ppb |
No | Specification |
| 404 | HC removal only | Ar, He, Kr, N2, Ne, Xe | Organics < 1 ppt Metals < 1 ppb |
Yes | Specification |
| Option | Description | Comments |
| F | 0.003 µm Particle Filter option | If not ordered, 2 µm filter standard |
| HF | 0.003 µm high-flow Particle Filter option | For use with MC4500 model only |
| V | Inlet and outlet valves | 1/4" or 1/2" Manual diaphragm Valves |
