Monitoring acidic and basic molecular contamination in leading edge lithography and metrology applications

San Luis Obispo, CA - February 12th, 2010 - SAES Pure Gas will be presenting the paper :"Monitoring acidic and basic molecular contamination in leading edge lithography and metrology applications: quantitative comparison of solid-state and impinger based sampling methods" at SPIE Advance Lithography in San Jose Feb 23-24

See our Microcontamination analytical and purification experts at the Metrology, Inspection, and Process Control for Microlithography XXIV poster session on Tuesday February 23 (San Jose Convention Center. A1; 6.00 pm) or visit SAES Pure Gas Inc. booth (#619)

SAES Pure Gas, located in San Luis Obispo, CA, is the world leader in scientific and technological applications where very low limits of impurities in gases are mandatory. By exploiting its core competencies, SAES develops ultra pure gas handling equipment for the semiconductor and other high technology markets by supplying gas purifiers for virtually all bulk and specialty gas applications. Leveraging the 20 years experience in the gas purification field, SAES Pure Gas is also emerging as a key player for the newest semiconductor applications such as: photolithography, metrology and inspection tool optics purge gases.